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duv和euv技術區别
duv和euv技術區别
更新时间:2025-08-17 08:09:48

  DUV是深紫外線(Deep Ultraviolet Lithography),EUV是極深紫外線(Extreme Ultraviolet Lithography)。從制程範圍來看,DUV基本上隻能做到25nm,Intel憑借雙工作台的模式做到了10nm,但是卻無法達到10nm以下。隻有EUV能滿足10nm以下的晶圓制造,并且還可以向5nm、3nm繼續延伸。

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